Forming self-aligned contacts on pillar structures

ABSTRACT

A method of forming a semiconductor structure includes forming two or more pillar structures over a top surface of a substrate. The method also includes forming two or more contacts to the two or more pillar structures. The method further includes forming an insulator between the two or more pillar structures and the two or more contacts. The two or more contacts are self-aligned to the two or more pillar structures by forming the insulator via conformal deposition and etching the insulator selective to a spin-on material formed over the insulator between the two or more pillar structures.

BACKGROUND

The present application relates to semiconductors, and morespecifically, to techniques for forming semiconductor structures.Magnetoresistive random access memory (MRAM) is a non-volatile computermemory (NVRAM) technology. In some conventional random access memory(RAM) devices, data is stored as electric charge or current flows. MRAM,in contrast, stores data using magnetic storage elements. Such elementsmay be formed using two ferromagnetic plates separated by a thininsulating later. One plate is a permanent magnet set to a particularpolarity, with the other plate having a field that can be changed tomatch that of an external field to store data. This configuration isknown as a spin valve and forms the structure for an MRAM bit or cell.An MRAM device may contain a grid of such structures or cells.

SUMMARY

Embodiments of the invention provide techniques for forming self-alignedcontacts on pillar structures.

For example, in one embodiment a method of forming a semiconductorstructure comprises forming two or more pillar structures over a topsurface of a substrate, forming two or more contacts to the two or morepillar structures, and forming an insulator between the two or morepillar structures and the two or more contacts, wherein the two or morecontacts are self-aligned to the two or more pillar structures byforming the insulator via conformal deposition and etching the insulatorselective to a spin-on material formed over the insulator between thetwo or more pillar structures.

In another embodiment, a semiconductor structure comprises two or morepillar structures disposed over a top surface of a substrate, two ormore contacts to the two or more pillar structures, and an insulatordisposed between the two or more pillar structures and the two or morecontacts, wherein the two or more contacts are self-aligned to the twoor more pillar structures.

In another embodiment, an integrated circuit comprises a semiconductorstructure comprising two or more pillar structures disposed over a topsurface of a substrate, two or more contacts to the two or more pillarstructures, and an insulator disposed between the two or more pillarstructures and the two or more contacts, wherein the two or morecontacts are self-aligned to the two or more pillar structures

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 depicts a side cross-sectional view of a structure with pillarsformed therein, according to an embodiment of the present invention.

FIG. 2 depicts a side cross-sectional view of the FIG. 1 structurefollowing spin-on of an additional material, according to an embodimentof the present invention.

FIG. 3 depicts a side cross-sectional view of the FIG. 2 structurefollowing an etch process, according to an embodiment of the presentinvention.

FIG. 4 depicts a side cross-sectional view of the FIG. 3 structurefollowing deposition of contacts and planarization, according to anembodiment of the present invention.

FIG. 5 depicts an isometric view of a structure with pillars formedtherein and a top-down view of the structure following formation ofcontacts and planarization, according to an embodiment of the presentinvention.

DETAILED DESCRIPTION

Illustrative embodiments of the invention may be described herein in thecontext of illustrative methods for forming self-aligned contacts onpillar structures, along with illustrative apparatus, systems anddevices having self-aligned contacts formed using such methods. However,it is to be understood that embodiments of the invention are not limitedto the illustrative methods, apparatus, systems and devices but insteadare more broadly applicable to other suitable methods, apparatus,systems and devices.

MRAM devices, as described above, may include a grid or otherarrangement of multiple cells. Spin transfer torque MRAM (STT-MRAM) is atype of MRAM device in which the spin of electrons can be flipped usinga spin-polarized current in a magnetic tunnel junction (MTJ). STT-MRAMcan provide a number of advantages, including reduced power consumptionand cost. Particularly, STT-MRAM provides advantages in scalingpermitting higher densities of MRAM cells at a lower cost. MTJs in MRAMdevices generally comprise of an insulating layer (e.g., the tunneljunction) formed between two or more ferromagnetic layers.

Surface topography can impact lithography due to misalignment. Toaccount for this, some semiconductor devices such as embedded MRAM(eMRAM) possibly using STT-MRAM technology design contacts to be largerthan features underneath the contacts. In STT-MRAM, for example, pillarsmay have a diameter of approximately 35 nanometers (nm). Contacts abovesuch pillars, however, may be made two to three times larger. Thus,improvements in density or smaller area for a device may be limited bycontact dimensions.

There are various techniques which may be utilized to overcome the aboveissues regarding scaling. As one example, surface planarization may beutilized to reduce or eliminate surface topography before patterning. Asanother example, advanced patterning techniques and materials such asorganic planarization layers (OPLs), silicon-containing anti-reflectivecoating (SiARC) layers, low temperature oxide (LTO) trilayers, etc. maybe used. As a further example, interlayer dielectric (ILD) thickness maybe increased before contact etching. This allows etching from furtheraway, and due to ILD tapering during etching contacts can be madesmaller as a result of the trench tapering.

Illustrative embodiments described herein utilize a spin-on material tocover and form puddles in crevices in a device. A protruding insulatorcan then be selectively etched to form contact trenches.

In a general process flow, pillars may be formed, followed by formationof an etch stop layer and insulator deposition. The etch stop layer maybe a nitride and the insulator may be an oxide. The oxide may then beplanarized, followed by lithography and insulator etching to formcontact trenches. Metal may then be deposited in the contact trenchesand chemical mechanical polishing (CMP) performed to form contacts. Insome embodiments, oxide planarization and lithography steps may bereplaced with the formation of spin-on materials such as photoresist oranti-reflective coating (ARC) as will be described in further detailbelow with respect to FIGS. 1-5.

FIG. 1 depicts a side cross-sectional view 100 of a structure withpillar structures formed therein. In the above-described general processflow, the FIG. 1 structure is an example of the structure followingformation of the etch stop layer and insulator. The FIG. 1 structureshows two pillar structures of varying size. It is to be appreciated,however, that this is not a requirement. In other embodiments, more orfewer than two pillar structures may be formed as desired. In addition,each pillar may have a same size, or more than two different sizes ofpillars may be formed as desired.

The FIG. 1 structure includes an underlying structure 102, also referredto herein as a substrate. The underlying structure 102 will vary basedon application. For example, if the FIG. 1 structure is used infabricating MRAM such as STT-MRAM, the underlying structure 102 will bethe supporting circuitry used to control and drive the MRAM. If the FIG.1 structure is used in fabricating a metal-insulator-metal (MIM)capacitor, then the underlying structure 102 may be an insulator orsemiconductor material. In some embodiments, the underlying structure102 is formed of silicon (Si), although other suitable materials may beused based on the application. As discussed above, for MRAM applicationsthe underlying structure 102 may provide supporting circuitry to controlMRAM functionality while for MIM capacitor applications the underlyingstructure 102 may be a conductor material. The underlying structure 102may have a vertical thickness (in the direction Y-Y′) and a horizontalwidth (in the direction X-X′) that varies as desired based on theapplication, the number of pillar structures and the spacing between thepillar structures.

FIG. 1 shows layers 104-1 and 104-2 formed beneath each of the pillarstructures in the underlying structure 102. The layers 104-1 and 104-2may be formed of a conductor material, and depending on the applicationmay provide bottom contacts or electrodes for a resulting structure. Thelayers 104-1 and 104-2 may be formed of copper (Cu), although othersuitable materials including but not limited to other conductingmaterials and alloys may be used. If the resulting structure is MRAM ora microelectromechanical system (MEMS), for example, the layers 104-1and 104-2 may comprise a conducting alloy. Each of the layers 104-1 and104-2 may have a vertical thickness in the direction Y-Y′ ranging asdesired for a particular application. Since the layers 104-1 and 104-2are conductors, their thickness may be determined by the resistancecriteria required for a particular application. Depending on thecriteria and conductor material, the thickness will vary. If, forexample, 100 ohm (Ω) is the criteria and the conducting material is Cu,then the thickness of the layers 104-1 and 104-2 would generally bethinner (for the same width and length) than if the conducting materialwere aluminum (Al). Each of the layers 104-1 and 104-2 may have ahorizontal width in the direction X-X′ that again may vary based on theapplication. For example, if the use case is MRAM then certaintechnology guidelines may govern the size of the layers 104-1 and 104-2(e.g., the horizontal width of the layers 104-1 and 1042-2 for 90 nmtechnology may have a different size compared to 28 nm technology).Although FIG. 1 shows an example wherein layers 104-1 and 104-2 are thesame size, this is not a requirement. For example, the horizontal widthsof the layers 104-1 and 104-2 may vary based on the size of the pillarstructures which are formed.

Pillars 106-1 and 106-2 are formed as shown, with capping layers 108-1and 108-2 formed over the pillars 106-1 and 106-2, respectively. Thepillar 106-1 and capping layer 108-1 may form a first pillar structure,while the pillar 106-2 and capping layer 108-2 form a second pillarstructure. The capping layers 108-1 and 108-2 may also be referred to ashard masks, as they may be used for patterning purposes in someapplications.

The pillars 106-1 and 106-2 are collectively referred to herein aspillars 106, and the capping layers 108-1 and 108-2 are collectivelyreferred to herein as capping layers 108. The pillars 106 may be formedof various materials depending on the application. For MRAMapplications, the pillars 106 may be formed of magnetic materialsseparated by an insulator. For MIM capacitor applications, the pillars106 may be formed of insulators with a high K value. For resistivememory (ReRAM), the pillars 106 may be formed of phase change materials.

The capping layers 108 may be formed of tantalum nitride (TaN), althoughother suitable materials including but not limited to titanium nitride(TiN) and tungsten (W) may be used. More generally, the capping layers108 are formed of a conductor material that is stable during downstreamprocesses. TaN, for example, may be used to get selectivity duringpatterning of the pillars 106 and to provide a good transition conductorbetween the pillars 106 and top contacts or electrodes formed to connectto the pillars 106. Thus, it is to be appreciated that various othermaterials may be used for the capping layers 108 depending on theapplication.

In some embodiments, the pillars 106 may form the MTJs for an MRAMdevice. In such embodiments, the pillars 106 may be formed from aninsulator sandwiched between two ferromagnetic layers as discussedabove. Example ferromagnetic materials which may be used include acobalt-nickel (Co—Ni) alloy, a cobalt-iron-boron (Co—Fe—B) alloy oranother suitable material including but not limited to other cobalt (Co)or nickel (Ni) alloys. More generally, materials with high magneticproperties may be utilized in some embodiments. The insulator formedbetween the ferromagnetic layers may be magnesium oxide (MgO), althoughother suitable materials may be used. The insulator, more generally, maybe formed of an oxide material which may be deposited thinly anduniformly, such that the oxide provides high barrier energy so thatelectrons cannot jump over but may tunnel through.

The pillars 106 may vary in size as desired. For example, the largerpillar 106-1 may have a vertical thickness in direction Y-Y′ rangingfrom 10 nm to 200 nm and a horizontal width in direction X-X′ rangingfrom 10 nm to 100 nm. The smaller pillar 106-2 may have a verticalthickness in direction Y-Y′ ranging from 10 nm to 200 nm and ahorizontal width in direction X-X′ ranging from 10 nm to 100 nm. Thecapping layers 108 may similarly vary in size. The horizontal width indirection X-X′ of each of the pillars 108 may match that of itsunderlying pillar 106. The vertical thickness in direction Y-Y′ of thecapping layers 108, however, may vary as desired. For the larger pillar106-1, the capping layer 108-1 may have a vertical thickness indirection Y-Y′ ranging from 10 nm to 100 nm. For the smaller pillar106-2, the capping layer 108-2 may have a vertical thickness indirection Y-Y′ ranging from 10 nm to 100 nm.

Etch stop layer 110 is formed over the top of the substrate 102 andsurrounding the pillars 106 and capping layers 108. The etch stop layer110 may be formed of a nitride material, although other suitablematerials including but not limited to insulator materials such assilicon oxide (SiO), silicon oxynitride (SiON), silicon oxycarbonitride(SiOCN), etc. that can be deposited below a required thermal budget maybe used. If the pillars 106 are formed during back end of line (BEOL)processing, then the deposition typically needs to be done at 400degrees Celsius (° C.) or lower. If the pillars are formed during frontend of line (FEOL) processing, then the deposition can be done at 700°C. or lower. The vertical thickness in direction Y-Y′ of the etch stoplayer 110 may range from 10 nm to 50 nm.

Insulator 112 is formed over the etch stop layer 110. The insulator 112may be an oxide, although other suitable materials may be used, such asmaterials having a different etch rate than the etch stop layer 110 inthe etch process used to create contact trenches described below withrespect to FIG. 3. The insulator 112 may be formed with a substantiallyuniform vertical thickness in direction Y-Y′ that is larger than thevertical thickness of the pillars 106 and the capping layers 108combined. This substantially uniform thickness is represented by theheight H labeled as shown in FIG. 1. In some embodiments H is at least50 nm taller or thicker (in direction Y-Y′) than the pillars 106 and thecapping layers 108. As illustrated, the thickness of the insulator 112above each of the pillars 106 is the same as the thickness of theinsulator 112 between the pillars 106. Thus, the insulator 112 forms“bumps” and “valleys” as shown. The bump above pillar 106-1 is labeled113-1, while the bump above pillar 106-2 is labeled 113-2. The bumps113-1 and 113-2 are collectively referred to herein as bumps 113. Theinsulator 112 may be formed using a conformal oxide deposition to createthe bumps 113 and the valleys between the bumps 113, which simplifiesetching processes discussed below.

FIG. 2 depicts a side cross-sectional view 200 of the FIG. 1 structurefollowing spin-on of an additional material 201. The spin-on material201 has a different etch rate than the insulator 112. The spin-onmaterial 202 may be an OPL, a flowable oxide or another suitablematerial including but not limited to spin-on dielectrics having adifferent etch rate than the insulator 112. FIG. 2 illustrates puddlingof the spin-on material 202 between or surrounding the bumps 113.

FIG. 3 depicts a side cross-sectional view 300 of the FIG. 2 structurefollowing etching to form contact trenches 301-1 and 301-2 collectivelyreferred to herein as contact trenches 301. The insulator 112 may beetched using reactive-ion etching (RIE), although other suitable etchingprocesses including anisotropic dry etches selective to spin-on material201 may be used in other embodiments. Following the etching, contacttrench 301-1 is formed over pillar 106-1 and contact trench 301-2 isformed over pillar 106-2. The forming of the spin-on material 201described with respect to FIG. 2 allows for avoiding a lithography stepsince the contact trenches 301 are self-align to the bumps 113 as aresult of the differing etch rates between the insulator 112 and thespin-on material 201.

FIG. 4 depicts a side cross-sectional view 400 of the FIG. 3 structurefollowing deposition of contacts and planarization. As shown, liners114-1 and 114-2 are formed in the trenches 301-1 and 301-2,respectively. The liners 114-1 and 114-2 are collectively referred toherein as liners 114. Liners 114 may be formed of TaN, Co or anothersuitable material that follows the BEOL technology may be used. Liners114 may have a thickness ranging from 0 to 300 nm depending on the BEOLtechnology that is used.

Top contacts 116-1 and 116-2 are formed over the liners 114 in thetrenches 301-1 and 301-2, respectively. Top contacts 116-1 and 116-2 arecollectively referred to herein as top contacts 116. The top contacts116 may also be referred to as top electrodes, as distinguished from thebottom contacts or electrodes provided by layers 104-1 and 104-2. Thetop contacts 116 may be formed of Cu, although other suitable materialsincluding but not limited to Al, W or another material specified by BEOLguidelines may be used. In some embodiments, the material used for thepillars 106, capping layers 108, liners 114 and top contacts 116 mayvary between pillars. For example, the material of the top contact 116-1may differ from the material of the top contact 116-2. The top contacts116 may have a vertical thickness in direction Y-Y′ which varies basedon the BEOL or FEOL guidelines. It is to be appreciated that due to thevarying heights of the pillars 106 and capping layers 108, the topcontacts 116-1 and 116-2 may have different vertical thicknesses. Afterthe liners 114 are formed and the material of the top contacts 116 aredeposited in the trenches 301, CMP may be used to planarize the topsurface of the FIG. 4 structure.

FIG. 5 depicts an isometric view 502 of a structure with pillars formedtherein and a top-down view 504 of the structure following formation ofthe top contacts and planarization.

The isometric view 502 shows nine discrete “islands” formed abovepillars. For clarity, only three of the islands 513-1, 513-2 and 513-3are labeled. The isometric view 502 corresponds generally to the sidecross-sectional view 100 shown in FIG. 1, although the number and sizingof the pillars is changed. Whereas FIG. 1 showed a structure with twodifferently-sized pillars in the direction X-X′, isometric view showsthree rows each having three pillars of the same size.

The isometric view 502, similar to the side cross-sectional view 100,shows the pillars covered by insulator material. Although in theisometric view 502 each of the islands are discrete, this is not arequirement. In other embodiments, two or more of the islands may beconnected. For example, islands in one or more of the “columns” indirection Y-Y′, such as islands 513-1 and 513-2, may be connected to oneanother. As another example, islands in one or more of the “rows” indirection X-X′, such as islands 513-1 and 513-3, may be connected to oneanother. Various other arrangements are possible, including arrangementsin which islands in multiple rows and/or columns are connected.

The top-down view 504 corresponds generally to the side cross-sectionalview 400 in FIG. 4, although the number and sizing of pillars is changedas described above. Liners 514 are formed above each pillar, and topcontacts 516 are formed above the liners 514. The liners 514 aresurrounded by insulator 512. The sizing and material types for theinsulator 512, liners 514 and top contacts 516 may be similar to thoseof the insulator 112, liners 114 and top contacts 116 described above.

As described above, one or more of the pillars shown and described withrespect to FIGS. 1-5 may be used in MRAM or eMRAM devices, such as inthe MTJs of STT-MRAM devices in some embodiments. In eMRAM applications,the eMRAM and self-aligned contacts are formed together using theprocess described above. To form contacts on the MRAM pillars, processesare altered from forming wires only to also making contacts to thepillars. The process described above with respect to FIGS. 1-5 separatespillar contacts without requiring additional lithography, givingflexibility to optimize eMRAM and contacts separately. For example,different metals, not strictly following back end of line (BEOL)standards such as Cu, may be used for contacts. Over or under etching tocontrol the contacts around pillars can also be done withoutcompromising wire processing. The formation of eMRAM with self-alignedcontacts may take place between processing for an M_(X-1) module and anM_(X) module during BEOL processing, where the subscript for M denotesthe number of layers or the level in BEOL processing. MRAM, for example,is typically inserted between two metal layers in BEOL processing.

While described above primarily with respect to eMRAM or MRAM devices,embodiments are not limited solely to use in forming eMRAM or MRAMdevices. In some embodiments, one or more pillars may be used to formcapacitors, such as MIM capacitors. In other embodiments, one or more ofpillars may be used to form resistors, such as resistors for phasechange memory or ReRAM. In some embodiments, different pillars on thesame structure may be used to form combinations of the above or to forman integrated circuit which includes combinations of the above, such asa device with any combination of MIM capacitors, STT-MRAM devices, MRAM,phase change memory, ReRAM, etc.

In some embodiments, a method of forming a semiconductor structurecomprises forming two or more pillar structures over a top surface of asubstrate, forming two or more contacts to the two or more pillarstructures, and forming an insulator between the two or more pillarstructures and the two or more contacts. The two or more contacts areself-aligned to the two or more pillar structures by forming theinsulator via conformal deposition and etching the insulator selectiveto a spin-on material formed over the insulator between or surroundingthe two or more pillar structures.

The method may further include forming an etch stop layer over the twoor more pillar structures and the top surface of the substrate, formingthe insulator over the etch stop layer such that a top surface ofportions of the insulator formed over tops of the two or more pillarstructures are higher than the top surface of the insulator formedbetween the two or more pillar structures, forming the spin-on materialover the top surface of the insulator between the two or more pillarstructures, forming two or more contact trenches by etching theinsulator and the etch stop layer formed over tops of the two or morepillar structures selective to the spin-on material, depositing contactmaterial in the two or more contact trenches, and planarizing to removethe spin-on material. The insulator and the spin-on material may havedifferent etch rates. The insulator may comprise an oxide and thespin-on material may comprise one of an OPL and a flowable oxide.

In some embodiments, a given one of the two or more pillar structurescomprises a pillar and a capping layer formed over the pillar. Thecapping layer may comprise TaN. The pillar may comprise an MTJ stack fora MRAM cell in some embodiments. The MTJ stack may comprise aninsulating layer formed between a first ferromagnetic layer and a secondferromagnetic layer. The insulating layer may comprise MgO and at leastone of the first ferromagnetic layer and the second ferromagnetic layercomprises at least one of a Co—Ni alloy and a Co—Fe—B alloy. The pillarmay comprise a MIM capacitor in other embodiments. The pillar maycomprise a resistor of at least one of a phase change memory structureand a ReRAM structure in other embodiments.

The method may further include forming one or more metal layers in thesubstrate beneath at least a portion of at least one of the two or morepillar structures.

In some embodiments, forming the two or more contacts comprisesdepositing a liner material in two or more contact trenches formed inthe insulator and depositing contact material over the liner material.The two or more contacts may comprise a first contact of a firstmaterial contacting a first one of the two or more pillar structures anda second contact of a second material different than the first materialcontacting a second one of the two or more pillar structures.

The two or more pillar structures may vary in size in some embodiments.For example, a first one of the two or more pillar structures may have afirst height relative to the top surface of the substrate and a secondone of the two or more pillar structures may have a second heightdifferent than the first height relative to the top surface of thesubstrate. As another example, a first one of the two or more pillarstructures may have a first width in a direction parallel to the topsurface of the substrate and a second one of the two or more pillarstructures may have a second width in the direction parallel to the topsurface of the substrate, the second width being different than thefirst width.

In some embodiments, a semiconductor structure comprises two or morepillar structures disposed over a top surface of a substrate, two ormore contacts to the two or more pillar structures, and an insulatordisposed between the two or more pillar structures and the two or morecontacts. The two or more contacts are self-aligned to the two or morepillar structures by forming the insulator via conformal deposition andetching the insulator selective to a spin-on material formed over theinsulator between two or more pillar structures. A given one of the twoor more pillar structures may comprise a pillar and a capping layerdisposed over the pillar, the pillar comprising an MTJ stack for an MRAMcell.

In some embodiments, an integrated circuit comprises a semiconductorstructure comprising two or more pillar structures disposed over a topsurface of a substrate, two or more contacts to the two or more pillarstructures, and an insulator disposed between the two or more pillarstructures and the two or more contacts. The two or more contacts areself-aligned to the two or more pillar structures by forming theinsulator via conformal deposition and etching the insulator selectiveto a spin-on material formed over the insulator between two or morepillar structures. A given one of the two or more pillar structures maycomprise a pillar and a capping layer disposed over the pillar, thepillar comprising an MTJ stack for an MRAM cell.

In the description above, various materials and dimensions for differentelements are provided. Unless otherwise noted, such materials are givenby way of example only and embodiments are not limited solely to thespecific examples given. Similarly, unless otherwise noted, alldimensions are given by way of example and embodiments are not limitedsolely to the specific dimensions or ranges given.

Semiconductor devices and methods for forming same in accordance withthe above-described techniques can be employed in various applications,hardware, and/or electronic systems. Suitable hardware and systems forimplementing embodiments of the invention may include, but are notlimited to, personal computers, communication networks, electroniccommerce systems, portable communications devices (e.g., cell and smartphones), solid-state media storage devices, functional circuitry, etc.Systems and hardware incorporating the semiconductor devices arecontemplated embodiments of the invention. Given the teachings providedherein, one of ordinary skill in the art will be able to contemplateother implementations and applications of embodiments of the invention.

In some embodiments, the above-described techniques are used inconnection with semiconductor devices that may require or otherwiseutilize, for example, complementary metal-oxide-semiconductors (CMOSs),metal-oxide-semiconductor field-effect transistors (MOSFETs), and/or finfield-effect transistors (FinFETs). By way of non-limiting example, thesemiconductor devices can include, but are not limited to CMOS, MOSFET,and FinFET devices, and/or semiconductor devices that use CMOS, MOSFET,and/or FinFET technology.

Various structures described above may be implemented in integratedcircuits. The resulting integrated circuit chips can be distributed bythe fabricator in raw wafer form (that is, as a single wafer that hasmultiple unpackaged chips), as a bare die, or in a packaged form. In thelatter case the chip is mounted in a single chip package (such as aplastic carrier, with leads that are affixed to a motherboard or otherhigher level carrier) or in a multichip package (such as a ceramiccarrier that has either or both surface interconnections or buriedinterconnections). In any case the chip is then integrated with otherchips, discrete circuit elements, and/or other signal processing devicesas part of either (a) an intermediate product, such as a motherboard, or(b) an end product. The end product can be any product that includesintegrated circuit chips, ranging from toys and other low-endapplications to advanced computer products having a display, a keyboardor other input device, and a central processor.

The descriptions of the various embodiments of the present inventionhave been presented for purposes of illustration, but are not intendedto be exhaustive or limited to the embodiments disclosed. Manymodifications and variations will be apparent to those of ordinary skillin the art without departing from the scope and spirit of the describedembodiments. The terminology used herein was chosen to best explain theprinciples of the embodiments, the practical application or technicalimprovement over technologies found in the marketplace, or to enableothers of ordinary skill in the art to understand the embodimentsdisclosed herein.

1. A method of forming a semiconductor structure, comprising: formingtwo or more pillar structures over a top surface of a substrate; formingtwo or more contacts to the two or more pillar structures; and formingan insulator between the two or more pillar structures and the two ormore contacts; wherein the two or more contacts are self-aligned to thetwo or more pillar structures by forming the insulator via conformaldeposition and etching the insulator selective to a spin-on materialformed over the insulator between the two or more pillar structures,wherein the two or more contacts comprise a first contact of a firstmaterial contacting a first one of the two or more pillar structures anda second contact of a second material different than the first materialcontacting a second one of the two or more pillar structures.
 2. Themethod of claim 1, further comprising: forming an etch stop layer overthe two or more pillar structures and the top surface of the substrate;forming the insulator over the etch stop layer such that a top surfaceof portions of the insulator formed over tops of the two or more pillarstructures are higher than the top surface of the insulator formedbetween the two or more pillar structures; forming the spin-on materialover the top surface of the insulator between the two or more pillarstructures; forming two or more contact trenches by etching theinsulator and the etch stop layer formed over tops of the two or morepillar structures selective to the spin-on material; depositing contactmaterial in the two or more contact trenches; and planarizing to removethe spin-on material.
 3. The method of claim 1, wherein the insulatorand the spin-on material have different etch rates.
 4. The method ofclaim 3, wherein the insulator comprises an oxide and the spin-onmaterial comprises one of an organic planarization layer and a flowableoxide.
 5. The method of claim 1, wherein a given one of the two or morepillar structures comprises a pillar and a capping layer formed over thepillar.
 6. The method of claim 5, wherein the capping layer comprisestantalum nitride (TaN).
 7. The method of claim 5, wherein the pillarcomprises a magnetic tunnel junction (MTJ) stack for a magnetic randomaccess memory (MRAM) cell.
 8. The method of claim 7, wherein the MTJstack comprises an insulating layer formed between a first ferromagneticlayer and a second ferromagnetic layer.
 9. The method of claim 8,wherein the insulating layer comprises magnesium oxide (MgO) and atleast one of the first ferromagnetic layer and the second ferromagneticlayer comprises at least one of a cobalt-nickel (Co—Ni) alloy and acobalt-iron-boron (Co—Fe—B) alloy.
 10. The method of claim 5, whereinthe pillar comprises a metal-insulator-metal (MIM) capacitor.
 11. Themethod of claim 5, wherein the pillar comprises a resistor of at leastone of a phase change memory structure and a resistive random accessmemory (ReRAM) structure.
 12. The method of claim 1, further comprisingforming one or more metal layers in the substrate beneath at least aportion of at least one of the two or more pillar structures.
 13. Themethod of claim 1, wherein forming the two or more contacts comprisesdepositing a liner material in two or more contact trenches formed inthe insulator and depositing contact material over the liner material.14. (canceled)
 15. A method of forming a semiconductor structure,comprising: forming two or more pillar structures over a top surface ofa substrate; forming two or more contacts to the two or more pillarstructures; and forming an insulator between the two or more pillarstructures and the two or more contacts; wherein the two or morecontacts are self-aligned to the two or more pillar structures byforming the insulator via conformal deposition and etching the insulatorselective to a spin-on material formed over the insulator between thetwo or more pillar structures, wherein a first one of the two or morepillar structures has a first height relative to the top surface of thesubstrate and a second one of the two or more pillar structures has asecond height different than the first height relative to the topsurface of the substrate.
 16. A method of forming a semiconductorstructure, comprising: forming two or more pillar structures over a topsurface of a substrate; forming two or more contacts to the two or morepillar structures; and forming an insulator between the two or morepillar structures and the two or more contacts; wherein the two or morecontacts are self-aligned to the two or more pillar structures byforming the insulator via conformal deposition and etching the insulatorselective to a spin-on material formed over the insulator between thetwo or more pillar structures, wherein a first one of the two or morepillar structures has a first width in a direction parallel to the topsurface of the substrate and a second one of the two or more pillarstructures has a second width in the direction parallel to the topsurface of the substrate, the second width being different than thefirst width.
 17. (canceled)
 18. (canceled)
 19. (canceled)
 20. (canceled)